Mono Ethylene Glycol
Product Qty Per Unit:
50.00
Product usage unit:
Kg
Product Delivery Locations:
Mumbai, JNPT, Nhava Seva, Pirpav Jetty, Ballard Pier, Mumbai Port Trust, Butcher Island, ONGC EMR Shed, MIdc, Pune, Maharastra
Generic Name:
Additive for engine cooling systems to prevent freezing and as an anti-boil additive.
Mono-ethylene glycol (MEG) also used as an antifreeze, which has the ability to protect engineered systems down to extreme temperatures as low as -50oC
Product Description:
Mono-ethylene glycol (MEG) pure and free from any impurities supplier in various standard and size.We are also exporting high quality MEG as per international standard and specification.
Product Application:
Mono-ethylene glycol (MEG) also used as an antifreeze, which has the ability to protect engineered systems down to extreme temperatures as low as -50oC.
MEG chemically providing protection against rust and corrosion for all parts of the cooling system
Product Procedure:
Product Note:
Product Technical Specification:
MONO ETHYLENE GLYCOL | ||
Test | Typical Value | Test Method |
Distillation Range °C |
194° 205° |
ASTM D-1078 |
Moiture Content % wt. Max.
|
0.2
|
ASTM E-203
|
Acidity as Acetic acid % wt. Max.
|
0.005
|
ASTM D-1613
|
Iron Cotent, ppm Weight Max.
|
0.2
|
ASTM E-202
|
Chloride as CI ppm, Weight Max.
|
0.2
|
SD A-167
|
Ash % Weight Max.
|
0.005
|
ISI 5295
|
DEG, % Weight Max.
|
0.2
|
SD-498
|
Colour (Pt. Co. scale) Max.
|
10
|
ASTM D-1209
|
Product pack size:
5, 10, 20, 25, 50, 210 Ltr Specialized pure product for Marine Shipping Division to protect engineered systems down to extreme temperatures as low as -50oC.
Product alias:
<p>
MEG, Monoethylene Glycol</p>
Mono Ethylene Glycol MEG are the important part of Coolant and Heat Transfer Liquid.
Mono Ethylene Glycol manufacturer and supplier in Chennai, Visakhapatnam, Kolkata, Mumbai, Surat, Kandla - Gandhidham. And we are keeping ready stock of Mono Ethylene Glycol, Di-Ethylene Glycol & Tri Ethylene Glycol at our distribution network in INDIA and Middle East.
Remarks: