TANTALUM PENTOXIDE AR
Product Qty Per Unit:
0.00
Product usage unit:
Box
Product Delivery Locations:
Mumbai, JNPT, Nhava Seva, Pirpav Jetty, Ballard Pier, Mumbai Port Trust, Butcher Island, ONGC EMR Shed, MIdc, Pune, Maharastra
Generic Name:
TANTALUM PENTOXIDE AR
Product Description:
Tantalum pentoxide, Ta2O5, is a high-index, low-absorption material usable for coatings in the near-UV (350 nm) to IR (>8 μm) regions. Dense, hard layers can be deposited by electron-beam evaporation or by sputtering. Typical applications include near-UV to near-IR antireflection and multilayer filter coatings.
Tantalum pentoxide, Ta2O5, is a high-index, low-absorption material usable for coatings in the near-UV (350 nm) to IR (>8 μm) regions. Dense, hard layers can be deposited by electron-beam evaporation or by sputtering. Typical applications include near-UV to near-IR antireflection and multilayer filter coatings.
Product Application:
Tantalum pentoxide, Ta2O5, is a high-index, low-absorption material usable for coatings in the near-UV (350 nm) to IR (>8 μm) regions. Dense, hard layers can be deposited by electron-beam evaporation or by sputtering. Typical applications include near-UV to near-IR antireflection and multilayer filter coatings. Tantala can be used in combination with low-index Silicon dioxide layers to form high index-contrast multilayer structures ranging from wide-band AR coatings to bandpass filters and dichroic beam-splitters.
Product Procedure:
Product Note:
Product Technical Specification:
Product pack size:
Product alias:
<p>
TANTALUM PENTOXIDE AR</p>
TANTALUM PENTOXIDE AR manufacturers, suppliers, exporters in Mumbai, Gandhidham, Kolkata, Varanasi, Visakhapatnam, Chennai, Fujairah, Dubai, Canada BC, Barka, Sohar, Muscat, Oman.
Lab chemicals manufacturers, suppliers, exporters in India, UAE Middle East, Barka, Sohar, Muscat, Oman, Canada.
TANTALUM PENTOXIDE AR is available in small packing as well as in bulk. Buy premium quality TANTALUM PENTOXIDE AR and other lab chemicals from one of the most trusted brands.
Remarks: